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| The AVI Photomask Metrology System |
Accurate defect and CD measurements
while your plates are on your inspection tool |
SEM Accuracy or better
Use on masks with or without pellicles
Defect/line measurement down to
0.1 µ
Contact measurement down to 0.3 µ
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Operates on binary or half-tone masks
5nm repeatability on hard / soft defects
Measure defects while reviewing
Operator-independent results
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AVI measurements correlate to printed defect size twice as well as SEM measurements. Reference:
Defect printability measurement on the KLA-351: Correlation to defect sizing using the AVI Metrology System by Intel Corporation and AVI.
Slide Show (Power Point)
AVI Photomask Metrology System (AVI_Presentation.pps)
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HOW DOES IT WORK?
The AVI sits next to your existing reticle inspection tool or other microscope, and uses its video signal to measure sizes accurately.
During defect review, the operator turns to the AVI system and clicks on the defect in question.
In one second, the AVIs patented Flux Area Measurement measures the amount of light the defect blocks or absorbs. Size is displayed as diameter or area.
The defect measurements, image and information are saved to a database for later review and analysis.
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WHAT CAN I MEASURE?
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DEFECTS: Down to 0.08 µ and smaller |
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CONTACT HOLES: 2-10 nm repeatability. |
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LINE WIDTH: Down to 0.25 µ. 1-2 nm repeatability. |
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OPC: 2-10 nm repeatability (1 sigma) |
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EDGE ROUGHNESS: 1-2 nm repeatability. |
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CORNER RADIUS: 2-10 nm repeatability. |
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PITCH: 1 part in 1000 |
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BUTTING ERROR: 1-2 nm repeatability. |
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LARGE DEFECTS: Maximum dimension size |
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SYSTEM SPECIFICATIONS
(Highlights Technical Specs Options)
System Highlights:
SEM accuracy or better: Measure defects / lines as small as 0.1 µm, contacts down to 0.3 µm.
Excellent repeatability: 5 nm, or 1% of size, on hard and soft defects.
Objective measurements: Get accurate, operator-independent results.
Easy to use: Measure defects while reviewing; requires just one mouse-click.
Fast: Highly reliable measurements in one second.
Repair / reject fewer masks.
Small Footprint: works with your existing reticle inspection system.
Increases reticle inspection system throughput and utilization.
Recover investment quickly: typical payback in only two months.
Technical Specs:
Measurements:
Measures hard and soft defects:
Diameter, Opacity, Height/Width, Max. Dimension
Line width and butting error down to 0.1 µ
Contact Size (Area)
Edge and CD Uniformity (range and standard deviation)
Corner Radius (absolute)
OPC: Area, Separation, Asymmetry
Built-in Statistics: Mean, Standard Deviation, Range
Operates on standard or phase-shift masks
Defect Size Range: 0.08 to 1.5 µ. Up to 100 µ depending on video source
Accuracy: 2% of defect size
Repeatability: 5 nm, or 1% of the defect size on defects 0.25 µ and larger. 7 nm for defects 0.08 µ to 0.25 µ.
Speed: 1-5 seconds per measurement
Compatibility: KLA3xx (including UV systems), KLA Starlight, KLA 2xx, Lasertec, DRS-I, DRS-II, KMS, Nikon, Probing Solutions, others on request
Calibration: Single-point calibration using a line pattern with known pitch.
Output: Screen, printout, email, spreadsheet and database
Defect Library: Images and measurements are stored in database for later review and analysis. Defect lists may be retrieved by customer, mask ID, comment, keyword, or date.
Equipment: Image processing computer; ethernet ready
System Options:
Interfaces for KLA-3xx, KLA-2xx, Lasertec, KMS, LWM, ARIS-I, DRS, PSI
Network defect review
Video Switch for sharing existing monitor
Maintenance and upgrade agreement
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