ADAS

Automated Defect Analysis System

Accurate and Complete Photomask Inspection Defect Analysis

One tool for automated and manual analysis of photomask defect inspections at all steps: ADI, 1st inspection, 2nd inspection, final inspection, qualification, and requalification.

ADAS provides automated defect analysis and a universal language for specifying mask defect disposition.

 For Mask Shops:

  • Eliminate missed defects
  • Increase mask yield
  • Increase inspection tool and AIMS productivity
  • Printability analysis (simulation) on every defect
  • Accelerate process development

 For Wafer Fabs:

  • Automate defect review and defect growth measurement
  • Increase mask cleaning intervals
  • Precise, non-subjective control of mask shop defect specs

DEFECT ANALYSIS IN THE MASK PROCESS

 

ELIMINATES MISSED DEFECTS

 

ACCELERATES PROCESS DEVELOPMENT

 

SYSTEM OVERVIEW

Read Inspections—Select inspections by mask ID, inspection ID, date, or defect status

Analyze Inspections—Classify and measure every defect on every inspection

Printability Measurement—Measure defect printability with built-in aerial image simulator

Defect Statistics—Display distribution of defect types and sizes

Compare Inspections and Masks—Combine and compare inspections to see changes and trends

Powerful Reports—Output reports for repair tools, customers, and for process management.

 

HOW DOES IT WORK?

The ADAS reads each inspection file from the inspection tool and analyzes every defect. A 1,000 defect inspection takes 10 seconds for complete analysis.

Each defect's "percent of spec" is explicitly computed from its size on the mask and printability compared to the customer's defect spec. The defect list is displayed with over-spec defects at the top, in red.

Defect distribution by position, type and size is shown. Multiple inspections can be combined, showing which defects have changed, and the distribution of defects at each stage.

 

DEFECT MAP

 

DEFECT STATISTICS